The ISIS3000 ion source produces a high current, variable energy ion beam for the cleaning of sample surfaces in UHV. It is easily adapted to most UHV systems and is supplied complete with a power supply.
The ion source
comprises an oscillating electron discharge source with electrostatic
extraction and focusing lens. Inert gas is leaked directly into the discharge
chamber where ions are formed at a selected energy of between 100 and 3000 eV.
The ions are extracted and focused into a spot of approximately 10 mm diameter
at the sample surface where the impact of the energetic ions physically removes
surface material thus cleaning the sample.
The gun has a simple rugged
design and includes dual filaments to extend in vacuum serviceability. The
electronics are 19 inch rack mounting and provide clear analogue metering of
beam energy, filament and discharge current.
Source | Electronics | ||
Beam Energy | 100 -3000 eV | Ion Energy variable | 0-3000 eV |
Beam Current | Typically 15 uA | Focus potential | 0 -100% |
Filament | Dual Tungsten/Thorium | Filament current | 0 to 4 A |
Mounting Flange | 70 mm OD CF port | Anode potential | 0 -100% |
Working Distance | 50 to 150 mm | Discharge current metering 0 -100 mA | |
Sample to Flange | up to 310 mm | Select filament 1, 2 or OFF | |
Gas inlet flange | 34 mm OD CF | The source can be run in discharge current metering stabilized mode for safe unattended operation. | |
Spot size at sample | ~ 10 mm | ||
Operating pressure | Typically 5 x 10e-6 mbar ( depending on pumping speed in the vacuum chamber.) |
Model No | Description |
ISIS3000 | Ion source complete with insertion length spacer collar, electronic control unit, source cable, spare filament assembly and instructions |